Vacuum Low-Pressure Plasma Cleaning Machine

Large Vacuum Low Pressure Plasma Cleaning Machine

Vacuum low-pressure plasma cleaning machines are engineered for superior surface treatment in both pre-production process verification and mass production. It delivers outstanding performance in cleaning, activation, and coating applications. Notably, our systems are ideal for the surface activation of hard-to-bond materials like PTFE, FEP, PEEK, and Silicones. To meet diverse industrial requirements, we offer models in various sizes and additional options — from small benchtop units for small-batch production to large-chamber systems capable of handling complex components in the semiconductor and automotive industries.

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Product Features

01

Self-developed human-machine interface and control system, comprehensive functions, simple to operate
02

Supports authority classification and independent password lock, with multiple interlocking functions to ensure the safety of equipment use. It can switch between manual mode and automatic mode
03

High vacuum chamber design with excellent sealing, makes the process gas more uniform, and the ultimate vacuum can reach below 5Pa
04

Over-temperature, overload, short circuit, and other abnormal prompts and alarm functions. The process gas pipe is not exposed to eliminate potential safety hazards
05

Unique discharge technology, plasma formation is uniform and stable, ensuring better effect
06

Ultra-low temperature treatment, no damage to the substrate, compatible with various materials
07

Layered design of vacuum chamber, flexible adjustment according to the size of the processed product
08

High-performance electrical components to ensure stable and reliable equipment quality. We can also customize key components according to your specific needs
09

Ergonomic design makes operation easy and comfortable. Innovative hinge design extends the service life of the seal. Equipped with casters, which are height-adjustable and dust-proof

Technical Parameter

Model	Capacity (L)	Chamber Dimension (mm)	Pallet Size (mm)	Power (W)	Frequency	Gas Channel	Gas Pressure	Control Mode	Vacuum Pump
JMD-20K Pro	20	260×260×300	225×255	500	40kHz	2-4 Ways	0.1-0.2 MPa	PLC+HMI	Oil Pump with Oil Mist Filter (Optional Upgrade with Dry Pump)
JMD-20M Pro	20	260×260×300	225×255	300	13.56 MHz, Automatic Tuning Network	2-4 Ways	0.1-0.2 MPa	PLC+HMI	Oil Pump with Oil Mist Filter (Optional Upgrade with Dry Pump)
JMD-35K Pro	35	300×300×400	265×355	500	40kHz	2-4 Ways	0.1-0.2 MPa	PLC+HMI	Oil Pump with Oil Mist Filter (Optional Upgrade with Dry Pump)
JMD-35M Pro	35	300×300×400	265×355	300	13.56 MHz, Automatic Tuning Network	2-4 Ways	0.1-0.2 MPa	PLC+HMI	Oil Pump with Oil Mist Filter (Optional Upgrade with Dry Pump)
JMD-60K Pro	60	400×400×400	365×355	1000	40kHz	2-4 Ways	0.1-0.2 MPa	PLC+HMI	Oil Pump with Oil Mist Filter (Optional Upgrade with Dry Pump)
JMD-60M Pro	60	400×400×400	365×355	500	13.56 MHz, Automatic Tuning Network	2-4 Ways	0.1-0.2 MPa	PLC+HMI	Oil Pump with Oil Mist Filter (Optional Upgrade with Dry Pump)
JMD-100K Pro	100	400×500×500	365×455	1500	40kHz	2-4 Ways	0.1-0.2 MPa	PLC+HMI	Oil Pump with Oil Mist Filter (Optional Upgrade with Dry Pump)
JMD-100M Pro	100	400×500×500	365×455	500/1000	13.56 MHz, Automatic Tuning Network	2-4 Ways	0.1-0.2 MPa	PLC+HMI	Oil Pump with Oil Mist Filter (Optional Upgrade with Dry Pump)

Related videos

The surface tension of the glass increases after plasma treatment, transforming the glass from hydrophobic to ultra-hydrophilic for flawless bonding and coating adhesion.

Cleaning Effect

Plasma cleaning systems play a key role in the cleaning process of optical devices and electronic components, effectively removing surface impurities and providing a clean, high-quality substrate for subsequent coating, printing, bonding, and spraying processes.

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